Nathan B. Bartlett is a doctoral student in Nuclear, Plasma, and Radiological Engineering at the University of Illinois at Urbana-Champaign with extensive experience in plasma-material interactions, high-vacuum systems, and computational modeling. His research focuses on plasma-assisted processes relevant to extreme ultraviolet (EUV) lithography, including ion scattering, chemical etching, and thin film deposition. Nathan has contributed to multiple experimental and theoretical projects in collaboration with leading institutions such as ASML and the ITER Organization. He has co-authored peer-reviewed publications and presented his work at major international conferences. Proficient in Python, MATLAB, Fortran, and several scientific simulation platforms, he combines strong technical and analytical skills with hands-on expertise in laboratory diagnostics and system design. Nathan brings a collaborative, research-driven mindset to advancing plasma science and engineering.